Two proven designs united: the Model 8425 DC Hall system with cryogenic probe station

Model 8425 Hall system with cryogenic probe stationModel 8425 Hall system with cryogenic probe station

Customers occasionally ask for even more specialized characterization and measurement tools than those offered in our standard systems. And, more often than not, we’re able to accommodate them by customizing a system for their unique application. When the same type of custom system is requested frequently, it only makes sense to offer it as a standard product.

This is, in part, how our new Model 8425 came about. Recognizing that many of you have asked for non-destructive Hall testing of wafer-scale materials and improved environmental control for Hall measurements, we have combined the DC Hall measurement capabilities of our 8400 Series Hall system with the flexibility and convenience of our CRX-VF cryogenic probe station to create the new Model 8425 system.

Measure in a vacuum environment in different temperatures and magnetic fields - no dicing required!Measure in a vacuum environment in different temperatures and magnetic fields—no dicing required!

As a fully integrated solution, it enables you to perform Hall measurements on wafer-scale materials up to 51 mm (2 in) in diameter—so there’s no need to dice and solder wiring to a sample, as is commonly required in a conventional Hall system—all while providing you with the latest in Lake Shore Hall measurement software for system operation, data acquisition, and material analysis.

Also, because the sample is under vacuum (which isn’t available on standard Hall systems), the Model 8425 is an ideal measurement platform for materials susceptible to degradation caused by atmospheric exposure or which may require initial baking to drive out moisture. Materials can be warmed in vacuum within the station to remove any residual moisture before running a measurement.

We believe the Model 8425 will benefit researchers who specifically need to perform variable temperature Hall measurements on larger material samples, particularly those with different test structures patterned on the same wafer. It should be helpful for characterizing III-V semiconductors, including HEMTs, as well as II-Vi and elemental semiconductors, such as FET structures progressively built on wafer substrates. Once you’ve created an initial set of devices, you can load the wafer into the Model 8425 station and run measurements, then repeat these measurements after successive fabrication steps. DC field measurement capabilities are the same as for our other 8400 systems, including Hall voltage, IV curves, resistance, and resistivity, and derived values, including Hall coefficient, Hall mobility, carrier type, carrier density, and magnetoresistance.

To learn more about the 8425, see our website and download our brochure. And if you already have a CRX-VF probe station and would like to add the 8400 Series Hall measurement capabilities to it, please note that we will also be offering a Hall measurement package for your station.

If you are interested or have any questions, please fill out this form:

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